| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing apparatus having high gas conductance capability, capable of dealing with a wide range of processes, without causing increase in production cost, having the function of preventing the plasma leakage, and capable of performing satisfactory plasma processing with stable plasma. SOLUTION: A discharge ring 16, formed into a circular shape, is provided around a mounting stand 2. This discharge ring 16 is provided with a sidewall portion 17 formed substantially vertically downward, and a bottom portion 18, extending in the vertical direction from the lower end of the side wall portion 17 toward the inside. The sidewall portion 17 consists of an inner cylindrical member 19 and an outer cylindrical member 20, which are concentrically arranged at a predetermined interval, and a discharge path passing through a gap 21 in between these members is formed. COPYRIGHT: (C)2005,JPO&NCIPI
|
