| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a vapor deposition mask which does not require severe temperature management during manufacture or storage and can well maintain the positional accuracy of mask parts even during vapor deposition with a structure obtained by fixing a metal mask for multiface layout provided with a plurality of the mask parts to a frame. <P>SOLUTION: The structure obtained by fixing a peripheral edge portion of the metal mask 12 provided with the plurality of the mask parts 15 in the state of flatly pulling the metal mask to the frame 13 having high rigidity is formed, by which the patterns of the mask parts are held at the desired patterns. In addition, the metal mask and the frame are both formed of an Invar material having a small coefficient of thermal expansion, by which the deflection of the metal mask is averted in spite of a temperature change. Further, the degradation in the positional accuracy in the mask parts is suppressed and the vapor deposition good in the positional accuracy is made possible even if the coefficient of thermal expansion of the metal mask is made smaller in spite of the temperature rise during the vapor deposition. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
