发明名称 |
FACILITY FOR PRODUCING SATURATED RAW MATERIAL SALT SOLUTION |
摘要 |
PROBLEM TO BE SOLVED: To provide a facility for producing a saturated raw material salt solution which comprises a compact dissolution tank and saves consumption of the raw material salt by obtaining the saturated salt solution with a prescribed concentration. SOLUTION: In the case of dissolving a raw material salt 2 in supplied water 1, the supplied water is detoured around a barrage 3D formed in a raw material salt dissolution tank 3A for detouring supplied water 1 so as to increase the contact surface area of the supplied water 1 with the raw material salt 2 and obtain the saturated salt solution 4 with a high salt concentration. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004321987(A) |
申请公布日期 |
2004.11.18 |
申请号 |
JP20030121989 |
申请日期 |
2003.04.25 |
申请人 |
HITACHI LTD;HITACHI ELECTRIC SYSTEMS LTD |
发明人 |
OKADA AKIHIKO;SHIONO SHIGEO;MUKONO SHIGEO;NAKAZAWA MASAMITSU;TATSUMIYA MASAAKI |
分类号 |
B01F1/00;(IPC1-7):B01F1/00 |
主分类号 |
B01F1/00 |
代理机构 |
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