发明名称 FACILITY FOR PRODUCING SATURATED RAW MATERIAL SALT SOLUTION
摘要 PROBLEM TO BE SOLVED: To provide a facility for producing a saturated raw material salt solution which comprises a compact dissolution tank and saves consumption of the raw material salt by obtaining the saturated salt solution with a prescribed concentration. SOLUTION: In the case of dissolving a raw material salt 2 in supplied water 1, the supplied water is detoured around a barrage 3D formed in a raw material salt dissolution tank 3A for detouring supplied water 1 so as to increase the contact surface area of the supplied water 1 with the raw material salt 2 and obtain the saturated salt solution 4 with a high salt concentration. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004321987(A) 申请公布日期 2004.11.18
申请号 JP20030121989 申请日期 2003.04.25
申请人 HITACHI LTD;HITACHI ELECTRIC SYSTEMS LTD 发明人 OKADA AKIHIKO;SHIONO SHIGEO;MUKONO SHIGEO;NAKAZAWA MASAMITSU;TATSUMIYA MASAAKI
分类号 B01F1/00;(IPC1-7):B01F1/00 主分类号 B01F1/00
代理机构 代理人
主权项
地址