发明名称 |
Device and method to determine exposure setting for image of scene with human-face area |
摘要 |
The invention provides a device and method to determine the exposure setting for an image of a scene with human-face area. Human-face-contour-like patterns are provided in advance. The human-face area of the scene is approximately determined according to a rule, and the specific unit of an exposure metering matrix for the image is also determined. The specific unit relates with the human-face area in the scene. Changing the weighting of the specific unit helps to modify the exposure metering matrix. The exposure setting of the image being captured is then determined according to the modified exposure metering matrix.
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申请公布号 |
US2004227826(A1) |
申请公布日期 |
2004.11.18 |
申请号 |
US20040846071 |
申请日期 |
2004.05.14 |
申请人 |
BENQ CORPORATION |
发明人 |
WU MU-HSING;TSAI CHAO-LIEN;TSAI HUNG-CHI |
分类号 |
H04N5/235;(IPC1-7):H04N5/262 |
主分类号 |
H04N5/235 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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