| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve stability and uniformity in film formation by stably supplying a source gas evaporated from a liquid (or solid) raw material, to a film-forming section. <P>SOLUTION: Charging lines 8a, 8b and 8c for passing the source gases respectively evaporated in carburetors 4a, 4b and 4c therein are each separately inserted into the mixing chamber 10 of a gas supply stabilizer 9. The mixing chamber 10 is installed in a heat insulating tank 11, and is filled with a heat insulation gas (a carrier gas) controlled to a constant temperature through a heat insulation gas pipe 12 and a heater 13. The plurality of source gases are controlled to a constant temperature, and uniformly mixed in the mixing chamber 10. Furthermore, an introduction pipe 15 is connected to the mixing chamber 10, and also to a gas inlet 18 of a film-forming apparatus 17 which is a kind of a atmospheric-pressure plasma CVD apparatus, through a concentration-measuring portion 16 for the source gases. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
