发明名称 PROXIMITY FIELD EXPOSURE MASK AND EXPOSURE EQUIPMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a highly durable proximity field exposure mask in which generation of static electricity in a mask can be prevented and the mask is protected against breakage or adhesion of dust particles due to static electricity. <P>SOLUTION: A conductive substance (e.g. ITO) is employed in the base material of a proximity field exposure mask 100 and at the pattern part (mask opening) thereof to produce a proximity field exposure mask which is entirely brought into conductive state. Partial concentration of static electricity at the proximity field exposure mask is avoided by controlling the potential of the mask and the mask can be protected against breakage due to static electricity. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004327486(A) 申请公布日期 2004.11.18
申请号 JP20030115931 申请日期 2003.04.21
申请人 CANON INC 发明人 NAKAZATO SHINJI
分类号 G03F1/00;G03F1/68;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/00
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