发明名称 |
CHEMICAL MECHANICAL ABRASIVE KIT AND CHEMICAL MECHANICAL GRINDING METHOD THEREOF COMPOSED OF AQUEOUS-BASED COMPOSITION |
摘要 |
PURPOSE: A grinding method and an abrasive are provided to prevent the expansion of a dishing at an over-grinding and the corrosion of a wiring portion and to improve the yield rate. CONSTITUTION: After grinding with an aqueous-based dispersion for a chemical mechanical grinding containing an abrasive grain, a chemical mechanical grinding is performed by using another aqueous-based composition containing more than one heterocyclic organic composition together. A chemical mechanical abrasive kit is composed of the aqueous-based dispersion for chemical mechanical grinding and the aqueous-based composition for chemical mechanical grinding. Thereby, the yield rate is improved by preventing the expansion of a dishing and the corrosion of a wiring portion.
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申请公布号 |
KR20040097933(A) |
申请公布日期 |
2004.11.18 |
申请号 |
KR20040033363 |
申请日期 |
2004.05.12 |
申请人 |
JSR CORPORATION |
发明人 |
SHIDA HIROTAKA;KONNO TOMOHISA;HATTORI MASAYUKI;KAWAHASHI NOBUO |
分类号 |
C09G1/02;H01L21/321;(IPC1-7):B24D3/20;C09K3/14 |
主分类号 |
C09G1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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