发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
<p>A lithographic projection apparatus comprising a collision protection apparatus for protecting internal parts against damage from a collision. The collision protection apparatus can comprise at least one damper for applying a braking force and/or for absorbing a collision force, reducing or eliminating any damage to delicate and costly parts. The collision protection apparatus can also monitor the position and velocity of a moving part to determine when a collision is likely. <IMAGE></p> |
申请公布号 |
EP1477858(A2) |
申请公布日期 |
2004.11.17 |
申请号 |
EP20040252797 |
申请日期 |
2004.05.14 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER MEULEN, FRITS;JACOBS, HERNES;TERKEN, MARTINUS ARNOLDUS HENRICUS |
分类号 |
H01L21/027;G03F7/20;(IPC1-7):G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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