发明名称 Lithographic apparatus and device manufacturing method
摘要 <p>A lithographic projection apparatus comprising a collision protection apparatus for protecting internal parts against damage from a collision. The collision protection apparatus can comprise at least one damper for applying a braking force and/or for absorbing a collision force, reducing or eliminating any damage to delicate and costly parts. The collision protection apparatus can also monitor the position and velocity of a moving part to determine when a collision is likely. <IMAGE></p>
申请公布号 EP1477858(A2) 申请公布日期 2004.11.17
申请号 EP20040252797 申请日期 2004.05.14
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER MEULEN, FRITS;JACOBS, HERNES;TERKEN, MARTINUS ARNOLDUS HENRICUS
分类号 H01L21/027;G03F7/20;(IPC1-7):G03F7/20 主分类号 H01L21/027
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