发明名称 Cleaning apparatus and method, and film growth reaction apparatus and method
摘要 Disclosed herein is an apparatus for cleaning an inner surface of a film growth reaction chamber, including a supporting unit, a cleaning unit, an electric motor and a power supply apparatus. The cleaning unit includes a surface facing the inner surface of the reaction chamber, and the surface is provided with a plurality of scraping structures. The electric motor is provided on the supporting unit and includes a driving shaft. One end of the driving shaft is connected to the cleaning unit so as to drive the cleaning unit to move. The power supply apparatus is connected to the electric motor. The cleaning apparatus of the present application provides a method for cleaning the inner surface of the reaction chamber, which is highly automatic, effective and timesaving, and may ensure the quality and consistency of cleaning process.
申请公布号 US9382619(B2) 申请公布日期 2016.07.05
申请号 US201213440862 申请日期 2012.04.05
申请人 Advanced Micro-Fabrication Equipment, Inc. 发明人 Jiang Yinxin;Sun Yijun;Du Zhiyou
分类号 C23C16/44;C23C16/458 主分类号 C23C16/44
代理机构 Kilpatrick Townsend & Stockton LLP 代理人 Kilpatrick Townsend & Stockton LLP
主权项 1. A cleaning apparatus for cleaning an inner surface of a film growth reaction chamber, comprising: a supporting unit comprising a top surface and a bottom surface; a cleaning unit comprising a surface facing the inner surface of the reaction chamber, the surface being provided with a plurality of scraping structures; an electric motor provided on the top surface of the supporting unit and comprising a driving shaft, one end of the driving shaft being connected to the cleaning unit so as to drive the cleaning unit to move; and a power supply apparatus connected to the electric motor: wherein a supporting apparatus is further provided in the reaction chamber, the supporting apparatus comprises a supporting end, the bottom surface of the supporting unit is detachably placed on the supporting end of the supporting apparatus, and the cleaning apparatus is detached from the supporting apparatus and moved out of the reaction chamber after a cleaning process is finished.
地址 Shanghai CN