发明名称 |
Device manufacturing method and lithographic apparatus |
摘要 |
A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. The distortion in the substrate wafer is measured after each exposure and processing step by comparing the position of a plurality of reference marks 20 to values in a database. <IMAGE>
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申请公布号 |
EP1477851(A1) |
申请公布日期 |
2004.11.17 |
申请号 |
EP20030252966 |
申请日期 |
2003.05.13 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
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分类号 |
G03F9/00;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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