PROCESS FOR THE PRODUCTION OF HIGH-MOLECULAR COMPOUNDS FOR PHOTORESIST,申请号KR20047015490-传众专利搜索

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发明名称	PROCESS FOR THE PRODUCTION OF HIGH-MOLECULAR COMPOUNDS FOR PHOTORESIST
摘要
申请公布号	KR20040097240(A)	申请公布日期	2004.11.17
申请号	KR20047015490	申请日期	2003.03.14
申请人		发明人
分类号	C08F6/16;C08F6/00;C08F6/02;C08F6/06;C08F20/28;G03F7/039	主分类号	C08F6/16
代理机构		代理人
主权项
地址

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