发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION |
摘要 |
<p>A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein: the alkali-soluble resin having an unsaturated group (A) is obtained by reacting: 100 parts by weight of a copolymer comprising 1 to 40 wt% structural units derived from (a) a radically polymerizable compound having a carboxyl group; 1 to 50 wt% structural units having a phenolic hydroxyl group which are derived from (b-1) a radically polymerizable compound having a phenolic hydroxyl group or (b-2) a radically polymerizable compound having a functional group convertible into a phenolic hydroxyl group after the copolymerization, other structural units of said copolymer being derived from (c) another radically polymerizable compound; with 0.1 to 20 parts by weight of (d) a radically polymerizable compound having an epoxy group. <??>The resin composition can form a radiation-sensitive film in a thickness greater than a deposit thickness and has a high resolution.</p> |
申请公布号 |
EP1477848(A1) |
申请公布日期 |
2004.11.17 |
申请号 |
EP20020790753 |
申请日期 |
2002.12.13 |
申请人 |
JSR CORPORATION |
发明人 |
IWANAGA, SHIN-ICHIRO;IWAMOTO, SATOSHI;KIMURA, TOORU;NISHIMURA, HIROKO;NISHIKAWA, KOJI |
分类号 |
G03F7/027;C08F290/12;G03F7/004;G03F7/033;G03F7/40;H01L21/027;(IPC1-7):G03F7/027;H01L21/288;H05K3/00 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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