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发明名称
有机金属化合物
摘要
本发明提供适于做为含第IV族金属之薄膜用之气相沉积前体之有机金属化合物，亦提供使用特定有机金属前体之含第IV族金属的薄膜之沉积方法。该等含第IV族金属之薄膜特别适合用于制造电子装置。093109194-p01.bmp
申请公布号
TW200424243
申请公布日期
2004.11.16
申请号
TW093109194
申请日期
2004.04.02
申请人
罗门哈斯电子材料有限公司
发明人
史纳可 迪欧 韦纳;鲍尔 麦可 布兰登
分类号
C08J5/18;C07F7/02;C07F7/30
主分类号
C08J5/18
代理机构
代理人
洪武雄;陈昭诚
主权项
地址
美国
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