| 摘要 |
Provided are an image sensor and a method for forming the same. The image sensor may include a substrate which includes a light receiving region and a light shielding region; a device isolation pattern which is provided in the light receiving region of the substrate and defines active pixels; and a device isolation region which is provided in the light shielding region of the substrate, and defines reference pixels. The device isolation pattern can define a pixel by a different method from the device isolation region. So, optical properties of the image sensor can be improved. |
