| 摘要 |
PURPOSE: A test pattern of a semiconductor device is provided to reduce time for EM(ElectroMigration) test of a test line and perform an accurate and secure EM(ElectroMigration) test by forming at least one of a plurality of branch lines which are the same as a test line in a line width. CONSTITUTION: A test line(30) has at least one of a plurality of branch lines(30A), wherein the branch lines is formed in a pad region. Each of the branch lines is the same as the test line in a line width. A plurality of tungsten patterns(31) are landed on each of the branch lines. An aluminum pad(32) is connected to the tungsten patterns.
|
