发明名称 |
Resist composition and patterning method |
摘要 |
A resist composition is provided comprising a fluorochemical surfactant which functions to reduce the contact angle of a coating of the resist composition with water or an aqueous base developer as the amount of the fluorochemical surfactant increases. The resist composition forms a coating having a thickness uniformity, free of defects, and wettable with an aqueous base developer when applied onto a substrate, and has a good storage stability in that particles do not increase during storage in solution form.
|
申请公布号 |
US6818148(B1) |
申请公布日期 |
2004.11.16 |
申请号 |
US19990401490 |
申请日期 |
1999.09.22 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
WATANABE SATOSHI;SAKURADA TOYOHISA;YANAGI YOSHITAKA;NAGURA SHIGEHIRO;ISHIHARA TOSHINOBU |
分类号 |
C09K13/00;G03F7/00;G03F7/004;(IPC1-7):C09K13/00 |
主分类号 |
C09K13/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|