EXHAUST GAS PROCESSING SYSTEM TO PREVENT BACKFLOW OF BYPRODUCTS

摘要

PURPOSE: An exhaust gas processing system is provided to prevent backflow of byproducts by installing a check valve at a predetermined position adjacent to a process chamber. CONSTITUTION: A process chamber(110) is used for providing a process gas to a semiconductor substrate(100) and performing a process for forming a layer on the semiconductor substrate. A vacuum unit is connected to the chamber in order to maintain a vacuum state of the chamber and discharge non-reactive gases and byproducts to the outside. A check valve(200) is installed at a connection line between the process chamber and the vacuum unit in order to prevent backflow of the byproducts.