发明名称 |
Manufacturing system method for processing a lithography mask container |
摘要 |
An electronic device (205) is attached to a container (200) that carries a lithography mask (201) through a semiconductor factory (100) form a first station (110) to a second station (120). In the device, a receiver unit (210) receives first data (111) indicating how the first station has used the mask in a first process; a memory unit (220) temporarily stores the first data; a processor unit (230) processes the first data and provides second data (122) indicating how the second station uses the mask in a second future process; and a transmitter unit (240) transmits the second data to the second station or to a factory host.
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申请公布号 |
US6817602(B2) |
申请公布日期 |
2004.11.16 |
申请号 |
US20010941284 |
申请日期 |
2001.08.28 |
申请人 |
FREESCALE SEMICONDUCTOR, INC. |
发明人 |
CHARLES ALAIN;MALTABES JOHN;MAUTZ KARL |
分类号 |
G03F7/20;(IPC1-7):B23Q1/64;G03C5/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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