发明名称 Manufacturing system method for processing a lithography mask container
摘要 An electronic device (205) is attached to a container (200) that carries a lithography mask (201) through a semiconductor factory (100) form a first station (110) to a second station (120). In the device, a receiver unit (210) receives first data (111) indicating how the first station has used the mask in a first process; a memory unit (220) temporarily stores the first data; a processor unit (230) processes the first data and provides second data (122) indicating how the second station uses the mask in a second future process; and a transmitter unit (240) transmits the second data to the second station or to a factory host.
申请公布号 US6817602(B2) 申请公布日期 2004.11.16
申请号 US20010941284 申请日期 2001.08.28
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 CHARLES ALAIN;MALTABES JOHN;MAUTZ KARL
分类号 G03F7/20;(IPC1-7):B23Q1/64;G03C5/00 主分类号 G03F7/20
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