INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS HAVING BUILT-IN LINEAR ANTENNA FOR LARGE AREA, CAPABLE OF REMOVING STANDING WAVE EFFECT CAUSED BECAUSE THE LENGTH OF SOURCE IS LENGTHENED ACCORDING TO LARGE AREA

摘要

PURPOSE: An inductively coupled plasma processing apparatus having a built-in linear antenna for large area is provided to generate simultaneously electric field and magnetic field in a plasma generation area within a reaction chamber by using the built-in linear antenna and a permanent magnet. CONSTITUTION: A plurality of linear antennas(32) are arranged in a constant interval in an inside of a reaction chamber(10). The linear antennas are connected to each other by using curved parts at the outside of the reaction chamber. A plurality of magnetic bodies(42) are used for generating the magnetic field intersecting the electric field generated from the linear antennas. The magnetic bodies are arranged nearly to the linear antennas.