CLEANING SYSTEM OF SEMICONDUCTOR DEVICE AND CLEANING METHOD USING THE SAME TO KEEP CONSTANT TEMPERATURE OF PHOSPHATE SOLUTION

摘要

PURPOSE: A cleaning system of a semiconductor device and a cleaning method using the same are provided to keep a constant temperature of phosphate solution by installing a preheating unit for preheating a wafer at a front end of an etch bath. CONSTITUTION: A plurality of etch baths(210) are used for storing chemicals. A plurality of cleaning baths(220,240) are installed between the etch baths in order to supply deionized water. One of the etch baths is used for storing heated phosphate solution to etch a silicon nitride layer. A preheating unit is installed at a front end of the etch bath for storing the heated phosphate solution in order to increase the temperature of the wafer.