FABRICATING METHOD OF CMOS IMAGE SENSOR FOR IMPROVING SENSIBILITY BY FORMING BARRIER ON OVER-COATING LAYER FORMED ON COLOR FILTER BY USING TRANSFLECTIVE RETICLE

摘要

PURPOSE: A fabricating method of a CMOS image sensor is provided to improve the sensibility of the CMOS image sensor by preventing a bridge phenomenon. CONSTITUTION: A color filter(26) is formed on a substrate(20) having a lower structure including a photodiode. An over-coating layer(27) using a negative photoresist layer is formed on the color filter. A barrier for preventing a bridge is formed on the over-coating layer by performing a photo process using a reticle. The reticle is formed with a transflective layer and a transmissive layer. A micro-lens(28) is formed on the over-coating layer including the barrier for preventing the bridge.