OPTICAL PROCESSOR AND OPTICAL PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To suppress treatment unevenness within a substrate.SOLUTION: The optical processor comprises: a light-source part for emitting light; and a treatment part in which an object to be treated is exposed to the light emitted from the light-source part. The treatment part includes: a treatment area in which the object to be treated is held and exposed to the light in an atmosphere of a treatment gas; and a preparation area in which the treatment gas passes while being exposed to the light and heads for the treatment area and disposition of the object to be treated is prohibited.SELECTED DRAWING: Figure 1