DROPLET DISCHARGING DEVICE, METHOD FOR FORMING PATTERN AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

A method for forming a pattern is disclosed which enables to improve position control of a droplet landed on a substrate which droplet is discharged from a droplet discharging device. A droplet discharging device which is improved in accuracy of droplet position after landing is also disclosed. A method for manufacturing a semiconductor device using such a droplet discharging device is further disclosed. The method for forming a pattern is characterized in that a droplet discharged from a discharge unit or a substrate onto which the droplet lands is irradiated with laser light, thereby controlling a droplet landing position. With this method, a pattern can be formed without using a photolithography process.