| 摘要 |
PROBLEM TO BE SOLVED: To provide an etching liquid composition for silver or a silver alloy which has excellent etching precision. SOLUTION: The etching liquid composition for silver or a silver alloy comprises nitric acid, an oxidizer other than nitric acid and water, and improves plane uniformity in etching. As the oxidizer, preferably, at least one selected from the group consisting of cerium ammonium nitrate, hydrogen peroxide, ammonium persulfate, potassium permanganate and periodic acid in which the standard electrode potential (25°C, E<SP>0</SP>) to the standard hydrogen electrode in an aqueous solution is≥1.7 V is used. The composition can form a uniform pattern on the surface of a substrate, and does not exert harmful effect on work environment as well. COPYRIGHT: (C)2005,JPO&NCIPI
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