| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a microwave plasma decomposition apparatus with an automatic control mechanism for providing the optimum plasm state by sensing the state of a hardly decomposable halide-containing gas producing source and a plasma state during decomposition treatment. <P>SOLUTION: This halide decomposing apparatus is equipped with a mixed gas preparing part 10, a plasma reaction tube 20, a microwave supply part 30, a movable discharge electrode 40, a pressure sensor S1, a plasma state sensor S2, temperature sensors S4 and S5, an interface S3 for sensing the state of a treatment object producing source and a control part 50 for controlling the mixed gas preparing part 10, the microwave supply part 30 and the movable discharge electrode 40 on the basis of an electric signal showing the plasma state and the state of gas to be treated detected by the respective sensors. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
