| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide an inspection light irradiation apparatus for possibly preventing particles from generating in a defect inspection of a laminate of resist film on a photomask blank and efficiently inspecting the defect such as contaminations on the resist film and thickness unevenness of the resist film. <P>SOLUTION: The inspection light irradiation apparatus detects the defect on the resist film by irradiating a light to the laminate of resist film of the photomask blank substrate, and is provided with an irradiation table on which the substrate with the laminate of resist film is placed, an upright support post provided on the irradiation table, a support movably attached along the support post, moving and driven by a motor and a light source attached to the support, driven and vertically turned by the motor. An irradiation height of the inspection light irradiated from the light source to a surface of the resist film of the substrate is changed by moving the support. An irradiation angle of the inspection light irradiated from the light source to the surface of the resist film of the substrate is changed by turning the light source. The apparatus possibly prevents generation of particles in the defect inspection of the laminate of resist film on the photomask blank and efficiently inspects the defect such as the contaminations on the resist film and the thickness unevenness of the resist film. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
