发明名称 MANUFACTURING METHOD OF PRINTING MASK AND FLIP CHIP -TYPE IC USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a printing mask and a flip chip-type IC, by which the surface of a passivation layer can effectively be prevented from being damaged at the time of printing paste. <P>SOLUTION: In the printing mask 6 where a plurality of long openings 7 are formed, edges along the longitudinal direction of the openings 7 are inclined with respect to a direction orthogonal to the arranging direction of the openings 7. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004319947(A) 申请公布日期 2004.11.11
申请号 JP20030204168 申请日期 2003.07.30
申请人 KYOCERA CORP 发明人 SHIMOAKA YOSHIO
分类号 H01L21/60;H01L23/485 主分类号 H01L21/60
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