| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inspection method for conditions of forming rugged pattern in a photosensitive resin layer by which whether the photosensitive resin layer is properly formed in accordance with specified conditions for formation or not can be easily and rapidly checked, and moreover, a high-quality liquid crystal display can be efficiently formed, and to provide a substrate with a rugged pattern to be used for the above inspection method. <P>SOLUTION: In a plurality of recessed stripes 6 of an evaluation pattern 4, a recessed stripe 6 where the surface of a substrate 1a is exposed in an exposure area smaller than the allowance is detected. Whether a photosensitive resin layer 3 is formed with proper exposure light quantity or not is determined based on the detected recessed stripe 6 by referring the test data relating to the optimum exposure light quantity preliminarily determined. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
