发明名称 DEVICE FOR OBSERVING/PROCESSING CHARGED PARTICLE BEAM
摘要 PROBLEM TO BE SOLVED: To provide a device for observing/processing a charged particle beam suppressing image disturbances and processing disturbances caused by vibrations or radial and thrust deflections of a rotating table used for a semiconductor manufacturing device and a testing/processing device, for example. SOLUTION: A clamp 20 is rotatably supported by a clamp base 19. At an end of the clamp 20, a rolling bearing 21 is attached to a pressure part base that is rotatably supported. At the other end of the clamp 20, there is a ball plunger 23 to be inserted therein. The ball plunger 23 has a spring inside a screw so that a pressing force is changed by tightening the screw. The clamp 20 is lifted by the ball plunger 23 and rotates so that the rolling bearing 21 presses an inclined surface of the rotating table 18, the surface being inclined in such a direction that a top surface of the rotating table 18 is made smaller. Radial and thrust deflections of the rotating table are thereby suppressed to improve vibration resistance. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004319236(A) 申请公布日期 2004.11.11
申请号 JP20030110975 申请日期 2003.04.16
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 TOMITA SHOJI;SUZUKI HIROYUKI
分类号 G01B15/00;G01B15/08;H01J37/20;(IPC1-7):H01J37/20 主分类号 G01B15/00
代理机构 代理人
主权项
地址