发明名称 Redistribution layer shielding of a circuit element
摘要 In some embodiments of the present invention, an apparatus includes an electromagnetic shielding structure. The electromagnetic shielding structure is formed at least partially in one or more redistribution layers formed on an integrated circuit die. The electromagnetic shielding structure substantially surrounds a circuit element, such as an inductor structure. The circuit element may be formed at least partially in the one or more redistribution layers. An inductor structure may be constructed as a loop structure at least partially in one or more redistribution layers formed on the integrated circuit die. The shielding structure may be formed at least partially in one or more redistribution layers of the integrated circuit die to enclose the inductor in a Faraday cage-like enclosure. The redistribution layers may be formed above integrated circuit pads or above a passivation layer of the integrated circuit die.
申请公布号 US2004222478(A1) 申请公布日期 2004.11.11
申请号 US20040814816 申请日期 2004.03.31
申请人 SILICON LABORATORIES, INC. 发明人 ZHANG LIGANG;ELDREDGE ADAM B.;THOMSEN AXEL;MISRA ABHAY
分类号 H01L23/552;H01L23/64;(IPC1-7):H01L29/82 主分类号 H01L23/552
代理机构 代理人
主权项
地址