Projection light system for the microlithographic reproduction of a mask on a wafer has a polarizing optical ray cube dividing unpolarized light from the mask into two and using one part

摘要

A projection light system for the microlithographic reproduction of a mask (4) on a wafer (10) comprises an illumination system (20), a polarizing optical ray divider cube (6) which splits unpolarized light from the mask into two (3b,3c), one part being reflected (8) and passed through an objective (1a) to the wafer. The other part is not used in imaging.