Exposure apparatus and measuring device for a projection lens

摘要

A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

主权项

1. An apparatus, comprising:
an illumination system; a projection lens configured to image an object in an object plane into an image plane, the projection lens comprising:
a housing; anda plurality of optical elements, one of the optical elements being a last optical element on an image side of the projection lens; and an immersion liquid between the projection lens and the image plane, the immersion liquid defining an interface between the immersion liquid and a surrounding gas, the interface extending between a bottom surface of the housing and the image plane, wherein:
the interface directly contacts the bottom surface of the housing;the interface directly contacts the image plane;the immersion liquid contacts the last optical element in a contact area which is planar and through which light passes during use of the apparatus;only one side of the last optical element contacts a liquid;the bottom surface of the housing surrounds the last optical element and is coplanar with the contact area; andthe apparatus is a microlithographic projection exposure apparatus.