| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate processing equipment capable of enhancing the throughput. SOLUTION: A processing block 2 for antireflection film, a processing block 3 for resist film and a developing block 4, each comprising a processing section and a single main carrying mechanism, are juxtaposed in the substrate processing equipment. Since the substrate processing equipment is controlled to forbid reception of a wafer W at a block where an abnormality has occurred, that processing block can receive the wafer W instantaneously upon elimination of the abnormality and thereby the throughput is enhanced. COPYRIGHT: (C)2005,JPO&NCIPI
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