发明名称 SAPPHIRE SUBSTRATE AND ITS PRODUCTION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a sapphire substrate in which chipping by scribing hardly occurs and its production method. SOLUTION: The sapphire substrate is characterized in that the orientation flat of the sapphire in which the major face is c-face, is formed on any one specific face of the faces vertical to the equivalent directions of <-1 -1 2 0>, <2 -1 -1 0>, and <-1 2 -1 0>. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004315314(A) 申请公布日期 2004.11.11
申请号 JP20030113315 申请日期 2003.04.17
申请人 NAMIKI PRECISION JEWEL CO LTD 发明人 FURUTAKI TOSHIRO;SUNAKAWA KAZUHIKO
分类号 B28D5/00;C30B29/20;(IPC1-7):C30B29/20 主分类号 B28D5/00
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