发明名称 DICOPPER (I) OXALATE COMPLEXES AS PRECURSOR FOR METALLIC COPPER DEPOSITION
摘要 The invention relates to dicopper (I) oxalate complexes, stabilised by means of neutral Lewis bases, such as alkenes or alkynes and the use of dicopper ( I) oxalate complexes as precursor for metallic copper deposition in which alkynes, alkenes, triarylphosphines, CO and isonitriles are used as neutral Lewis bases.
申请公布号 CA2525521(A1) 申请公布日期 2004.11.11
申请号 CA20042525521 申请日期 2004.03.29
申请人 BASF AKTIENGESELLSCHAFT 发明人 KOEHLER, KATRIN
分类号 C07F1/08;H05K3/10 主分类号 C07F1/08
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