发明名称 ELECTRON BEAM IRRADIATION DEVICE AND METHOD OF MANUFACTURING OPTICAL FIBER
摘要 PROBLEM TO BE SOLVED: To provide an electron beam irradiation device capable of improving productivity by essentially setting an increase in transmission loss to be zero and increasing the drawing speed of an optical fiber, or the like, and reducing production costs, and to provide a manufacturing method of the optical fiber using the electron beam irradiation device. SOLUTION: In the electron beam irradiation device, a division section for irradiating an object to be treated with electron rays in gas is provided in a vacuum chamber, a means for generating electron beams is provided outside the division section, and the object to be treated is irradiated with electron beams through a window for transmitting electron beams being provided at the division section. In the electron beam irradiation device, the inner surface of the division section and/or the window for transmitting electron beams is composed of an element whose atomic number is 13 or less. Braking X rays can be reduced by the electron beam irradiation device. Therefore, especially, an increase in transmission loss can be essentially set to zero by irradiating the optical fiber, or the like, with electron beams. Further, the drawing speed of the optical fiber, or the like, can be increased, and the production costs can be reduced, thus improving the productivity in the optical fiber, or the like. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004317284(A) 申请公布日期 2004.11.11
申请号 JP20030111261 申请日期 2003.04.16
申请人 SHIN ETSU CHEM CO LTD 发明人 KAWADA ATSUO;OBA TOSHIO
分类号 G21K5/04;G02B6/44;G21K5/00;G21K5/10;(IPC1-7):G21K5/04 主分类号 G21K5/04
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