发明名称 |
METHOD FOR MAKING A PLANAR SUSPENDED MICROSTRUCTURE, USING A SACRIFICIAL LAYER OF POLYMER MATERIAL AND RESULTING COMPONENT |
摘要 |
<p>The invention concerns a method which consists in successively depositing a polymeric sacrificial layer (2), depositing, on at least part of the substrate (1) and the front surface of the sacrificial layer (2), an embedding layer (6), with a thickness greater than that of the sacrificial layer (2) and performing planarization such that the front surfaces of the sacrificial layer (2) and of the embedding layer (6) form a common planar surface. A forming layer (3) of a suspended structure (5) is deposited on the front face of the common planar surface. The planarization can include chemical mechanical polishing and etching the embedding layer (6). Etching the sacrificial layer (2) can be performed by means of a mask, formed on the front surface of a polymer material layer, removed during the planarization step.</p> |
申请公布号 |
WO2004056698(A3) |
申请公布日期 |
2004.11.11 |
申请号 |
WO2003FR03789 |
申请日期 |
2003.12.18 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE;ROBERT, PHILIPPE;MICHEL, FRANCE;MAEDER-PACHURKA, CATHERINE;SILLON, NICOLAS |
发明人 |
ROBERT, PHILIPPE;MICHEL, FRANCE;MAEDER-PACHURKA, CATHERINE;SILLON, NICOLAS |
分类号 |
B81B3/00;B81C1/00;(IPC1-7):B81C1/00 |
主分类号 |
B81B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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