Nozzle device and substrate treating apparatus having using the device

摘要

A nozzle device forms a treatment film with a uniform thickness on a substrate with a small amount of treatment liquid and a substrate treatment device. A nozzle device 10 includes a plurality of discharge ports 18 formed on the bottom, a liquid retaining chamber 22 for retaining supplied treatment liquid, and a liquid discharge paths 23 and 17 that communicate with each discharge port 18 on one end and communicate with the retaining chamber 22 on the other end. The paths allow the treatment liquid retained in the liquid retaining chamber 22 to flow to the discharge ports 18 where the liquid is discharged. The discharge ports 18 are arranged in double rows along a longitudinal direction of the nozzle device 10. The discharge ports of one row is staggered with respect to the discharge ports of the other row so that the discharge ports 18 form a staggered pattern in the arranged direction.