发明名称 |
SUBSTRATE TREATING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treating device that can accurately treat substrates by quickly transporting the substrates. SOLUTION: This substrate treating device is provided with a heat-treating section 16 equipped with a hot plate 17 which heats the substrates W and a cooling plate 18 which cools the substrates W, a liquid-chemical treating section which treats the substrates W with a liquid chemical, and a first transporting mechanism which transports the substrates W between the heat-treating section 16 and liquid-chemical treating section. This device is also provided with a second transporting mechanism 12 which transports the substrates W between the hot plate 17 and the cooling plate 18. The second transporting mechanism 16 receives and delivers the substrates W from and to the substrate transporting arm 5a of the first transporting mechanism at a receiving and delivering position E provided at a position other than the position above the hot plate 17 or cooling plate 18. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004319614(A) |
申请公布日期 |
2004.11.11 |
申请号 |
JP20030108678 |
申请日期 |
2003.04.14 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
OGURA HIROYUKI;MATSUI HIROSHI;TSUJI MASAO;NISHIMURA EIJI;YAMAMOTO SATOSHI;MACHIDA EISAKU |
分类号 |
H01L21/677;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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