发明名称 SUBSTRATE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treating device that can accurately treat substrates by quickly transporting the substrates. SOLUTION: This substrate treating device is provided with a heat-treating section 16 equipped with a hot plate 17 which heats the substrates W and a cooling plate 18 which cools the substrates W, a liquid-chemical treating section which treats the substrates W with a liquid chemical, and a first transporting mechanism which transports the substrates W between the heat-treating section 16 and liquid-chemical treating section. This device is also provided with a second transporting mechanism 12 which transports the substrates W between the hot plate 17 and the cooling plate 18. The second transporting mechanism 16 receives and delivers the substrates W from and to the substrate transporting arm 5a of the first transporting mechanism at a receiving and delivering position E provided at a position other than the position above the hot plate 17 or cooling plate 18. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004319614(A) 申请公布日期 2004.11.11
申请号 JP20030108678 申请日期 2003.04.14
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 OGURA HIROYUKI;MATSUI HIROSHI;TSUJI MASAO;NISHIMURA EIJI;YAMAMOTO SATOSHI;MACHIDA EISAKU
分类号 H01L21/677;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/677
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