发明名称 |
SPUTTERING TARGET |
摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target by which the defects of a thin film caused by nodules can be reduced. SOLUTION: In the sputtering target having an erosion region which is eroded and a non-erosion region which is not eroded on sputtering, the surface roughness (Ra) of the upper face in the non-erosion region is≥2.0μm. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004315931(A) |
申请公布日期 |
2004.11.11 |
申请号 |
JP20030114223 |
申请日期 |
2003.04.18 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
NODA HIROSHI;OCHIAI HIROMITSU;HAGIWARA TOMOHISA;MIYASHITA HAJIME |
分类号 |
C23C14/34;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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