发明名称 SPUTTERING TARGET
摘要 PROBLEM TO BE SOLVED: To provide a sputtering target by which the defects of a thin film caused by nodules can be reduced. SOLUTION: In the sputtering target having an erosion region which is eroded and a non-erosion region which is not eroded on sputtering, the surface roughness (Ra) of the upper face in the non-erosion region is≥2.0μm. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004315931(A) 申请公布日期 2004.11.11
申请号 JP20030114223 申请日期 2003.04.18
申请人 DAINIPPON PRINTING CO LTD 发明人 NODA HIROSHI;OCHIAI HIROMITSU;HAGIWARA TOMOHISA;MIYASHITA HAJIME
分类号 C23C14/34;(IPC1-7):C23C14/34 主分类号 C23C14/34
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