发明名称 |
TFT array inspection apparatus |
摘要 |
A TFT array inspection apparatus inspects a TFT array by irradiating an electron beam on a TFT substrate to obtain potential information. The TFT array inspection apparatus includes a scanning device for scanning the TFT substrate with an electron beam; a defect detecting device for detecting a defective site on the TFT substrate from a scanning signal of the TFT substrate; an irradiating device for irradiating the electron beam on the detected defective site; and a defect analyzing device. The defect analyzing device analyzes at least a type and/or an extent of the defect of the defective site based on a waveform change of a secondary electron signal detected through the electron beam irradiation and a driving state of the TFT.
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申请公布号 |
US2004223140(A1) |
申请公布日期 |
2004.11.11 |
申请号 |
US20040825334 |
申请日期 |
2004.04.16 |
申请人 |
SHIMADZU CORPORATION |
发明人 |
SHONOHARA MAKOTO |
分类号 |
G01N21/00;G01N23/225;G01R31/302;G02F1/13;G02F1/1368;G09F9/00;H01L29/786;(IPC1-7):G01N21/00 |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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