发明名称 TFT array inspection apparatus
摘要 A TFT array inspection apparatus inspects a TFT array by irradiating an electron beam on a TFT substrate to obtain potential information. The TFT array inspection apparatus includes a scanning device for scanning the TFT substrate with an electron beam; a defect detecting device for detecting a defective site on the TFT substrate from a scanning signal of the TFT substrate; an irradiating device for irradiating the electron beam on the detected defective site; and a defect analyzing device. The defect analyzing device analyzes at least a type and/or an extent of the defect of the defective site based on a waveform change of a secondary electron signal detected through the electron beam irradiation and a driving state of the TFT.
申请公布号 US2004223140(A1) 申请公布日期 2004.11.11
申请号 US20040825334 申请日期 2004.04.16
申请人 SHIMADZU CORPORATION 发明人 SHONOHARA MAKOTO
分类号 G01N21/00;G01N23/225;G01R31/302;G02F1/13;G02F1/1368;G09F9/00;H01L29/786;(IPC1-7):G01N21/00 主分类号 G01N21/00
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