A method and apparatus is disclosed for performing lithography operation. A fiber laser (18) is provided that generates laser light that is used by adaptive optics (20) to focus the laser light onto a plasma target (30) to generate plasma as a source of EUV radiation.
申请公布号
WO2004097520(A2)
申请公布日期
2004.11.11
申请号
WO2004US12714
申请日期
2004.04.26
申请人
THE REGENTS OF THE UNIVERSITY OF MICHIGAN;MOUROU, GERARD, A.;GALVANAUSKAS, ALMANTAS;THEOBALD, WOLFGANG;NEES, JOHN;HOU, BIXUE
