发明名称 |
Mikrostrukturanordnung, Verfahren und Form zur Erzeugung der Mikrostrukturanordnung, Mikrolinsenanordnung |
摘要 |
In a method of fabricating an array of microstructures, a substrate with an electrically-conductive portion is provided, an insulating mask layer is formed on the electrically-conductive portion of the substrate, a plurality of openings are formed in the insulating mask layer to expose the electrically-conductive portion, and a first plated or electrodeposited layer is deposited in the openings and on the insulating mask layer by electroplating or electrodeposition. A second plated layer is further formed on the first plated or electrodeposited layer and on the electrically-conductive portion by electroless plating to reduce a size distribution of microstructures over the array. <IMAGE> |
申请公布号 |
DE60007212(T2) |
申请公布日期 |
2004.11.11 |
申请号 |
DE2000607212T |
申请日期 |
2000.04.03 |
申请人 |
CANON K.K., TOKIO/TOKYO |
发明人 |
TESHIMA, TAKAYUKI;YAGI, TAKAYUKI;SHIMADA, YASUHIRO;USHIJIMA, TAKASHI |
分类号 |
B29C33/38;B29L11/00;G02B3/00;(IPC1-7):G02B3/00;B01J23/89 |
主分类号 |
B29C33/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|