发明名称 Mikrostrukturanordnung, Verfahren und Form zur Erzeugung der Mikrostrukturanordnung, Mikrolinsenanordnung
摘要 In a method of fabricating an array of microstructures, a substrate with an electrically-conductive portion is provided, an insulating mask layer is formed on the electrically-conductive portion of the substrate, a plurality of openings are formed in the insulating mask layer to expose the electrically-conductive portion, and a first plated or electrodeposited layer is deposited in the openings and on the insulating mask layer by electroplating or electrodeposition. A second plated layer is further formed on the first plated or electrodeposited layer and on the electrically-conductive portion by electroless plating to reduce a size distribution of microstructures over the array. <IMAGE>
申请公布号 DE60007212(T2) 申请公布日期 2004.11.11
申请号 DE2000607212T 申请日期 2000.04.03
申请人 CANON K.K., TOKIO/TOKYO 发明人 TESHIMA, TAKAYUKI;YAGI, TAKAYUKI;SHIMADA, YASUHIRO;USHIJIMA, TAKASHI
分类号 B29C33/38;B29L11/00;G02B3/00;(IPC1-7):G02B3/00;B01J23/89 主分类号 B29C33/38
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