发明名称 SHOWER HEAD STRUCTURE AND TREATMENT EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To provide a shower head structure capable of enhancing the in-plane uniformity of film thickness using a small quantity of purging inert gas even when a radiation thermometer is employed. SOLUTION: The shower head structure arranged to inject treatment gas into a treatment vessel 4 from a plurality of gas injection holes 16A and 16B provided at a shower head section 62 in order to heat treat a workpiece W mounted on a mounting table 26 in the treatment vessel comprises a temperature observing through hole 72 formed at the shower head section to face the mounting table, a transparent observation window 76 for hermetically sealing the upper end part of the temperature observing through hole, a radiation thermometer 70 provided on the outside of the transparent observation window in order to observe the temperature of the workpiece, a passage 80 for supplying inert gas into the temperature observing through hole, and a nozzle section 82 provided at the forward end part of the inert gas supply passage in order to inject inert gas toward the transparent observation window. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004319537(A) 申请公布日期 2004.11.11
申请号 JP20030107031 申请日期 2003.04.10
申请人 TOKYO ELECTRON LTD 发明人 MATSUMOTO KENJI
分类号 C23C16/44;C23C16/455;H01L21/00;H01L21/205;(IPC1-7):H01L21/205 主分类号 C23C16/44
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