| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photographic sensitive material having good humidity resistance and improved blocking and scuffing resistances. SOLUTION: The heat developable photographic sensitive material includes a photosensitive layer containing organic silver salt grains, silver halide grains and a reducing agent on a support, wherein at least one layer between the photosensitive layer and an outermost layer on the photosensitive layer side contains≥70 mass% of vinylidene chloride. A support for a heat developable photosensitive material which ensures little variation of photographic performances under various environmental conditions, has good blocking and scuffing resistances even at high temperature, and is excellent as a heat developable photosensitive material for printing and such a heat developable photosensitive material are obtained. COPYRIGHT: (C)2005,JPO&NCIPI
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