发明名称 |
FERROELECTRIC FILM, ITS MANUFACTURING METHOD, AND SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a ferroelectric film having a Bi-layered perovskite structure with good properties by means of crystallization at low temperature. SOLUTION: This method for manufacturing a ferroelectric film includes a process of forming a ferroelectric film by crystallizing an ingredient solution including a primary solution and a secondary solution which is different in composition from the primary solution. The primary solution is for making a ferroelectric material having a Bi-layered perovskite structure and the secondary solution is for making ABO<SB>3</SB>-based oxide whose A site is lead. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004319995(A) |
申请公布日期 |
2004.11.11 |
申请号 |
JP20040095939 |
申请日期 |
2004.03.29 |
申请人 |
SEIKO EPSON CORP |
发明人 |
KARASAWA JUNICHI;KIJIMA TAKESHI;NATORI EIJI |
分类号 |
H01G4/33;H01L21/316;H01L21/8246;H01L27/105;(IPC1-7):H01L27/105 |
主分类号 |
H01G4/33 |
代理机构 |
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地址 |
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