发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor storage device provided with floating electrodes having good charge holding characteristics. SOLUTION: In the nonvolatile semiconductor storage device, an insulating slit 18A is formed between the floating electrodes 18 of two nonvolatile storage elements adjoining each other with an element isolation region 17 in between, and a slit insulating layer 19-2 is embedded in the slit 18A. In addition, a control electrode 20 is formed astride the floating electrodes 18 of the adjoining nonvolatile storage elements through the slit insulating layer 19-2 and an inter-electrode insulating film 19-1. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004319586(A) 申请公布日期 2004.11.11
申请号 JP20030107991 申请日期 2003.04.11
申请人 TOSHIBA CORP 发明人 SONODA MASAHISA;TSUNODA HIROAKI;MORI SEIICHI
分类号 H01L21/8247;H01L27/115;H01L29/423;H01L29/788;H01L29/792;(IPC1-7):H01L21/824 主分类号 H01L21/8247
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