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发明名称
METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR SUBSTRATES AFTER POLISHING OF COPPER FILM
摘要
申请公布号
EP1086191(A4)
申请公布日期
2004.11.10
申请号
EP19990907149
申请日期
1999.02.18
申请人
LAM RESEARCH CORPORATION
发明人
LI, XU;ZHAO, YUEXING;HYMES, DIANE, J.;DELARIOS, JOHN, M.
分类号
C11D1/00;C09K13/00;C09K13/06;C09K13/08;C11D3/02;C11D7/02;C11D7/04;C11D7/08;C11D7/26;C11D11/00;C23G1/10;H01L21/02;H01L21/304;H01L21/306;H01L21/308;H01L21/3205;H01L21/321;(IPC1-7):C09K13/00;C09K13/02;C09K13/04
主分类号
C11D1/00
代理机构
代理人
主权项
地址
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