发明名称
摘要 A photosensitive polyimide resin 12 is exposed and developed via a computer-aided designed (CAD) pattern film 14 to form a pattern onto a mold base 11 by means of photoresisit method. A molded pattern 13 is thus formed to construct a mold 10. An optical panel 2 is formed by the use of the mold 10 with an optical pattern 3 comprising circular or rectangular dot holes or dot projections each of which is several mums and arranged in high density which is a reversal of the molded pattern 13. The optical pattern 3 performs light guiding or diffusion of incident light in high luminance and with a high degree of uniformity, thereby achieving secondary illumination without having see-through of the optical pattern.
申请公布号 KR100456242(B1) 申请公布日期 2004.11.10
申请号 KR20010014925 申请日期 2001.03.22
申请人 发明人
分类号 G02B27/00;G03F7/038;B29C39/26;F21V8/00;F21Y103/00;G02B5/02;G02B6/00;G02F1/13357;G03F7/00;G03F7/039;G03F7/20 主分类号 G02B27/00
代理机构 代理人
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