| 摘要 |
A photomask provided with a light-shielding coating on a surface of a glass substrate is cleaned with O<SUB>3 </SUB>gas solved water to eliminate organic substances adhered on a surface of the photomask (S 120 ). Using an alkaline chemical such as alkaline ionized water or hydrogenated water, the photomask is then cleaned to eliminate contamination (S 122 ). After completion of these cleaning steps, the photomask is dried (S 124 ).
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